| Optical properties of Au colloids self-organized into rings via copolymer templates SS Lamarre, A Sarrazin, J Proust, H Yockell-Lelièvre, J Plain, AM Ritcey, ... Journal of nanoparticle research 15, 1-6, 2013 | 20 | 2013 |
| DSA planarization approach to solve pattern density issue PP Barros, A Gharbi, A Sarrazin, R Tiron, N Posseme, S Barnola, S Bos, ... Advanced Etch Technology for Nanopatterning IV 9428, 47-56, 2015 | 19 | 2015 |
| Surface affinity role in graphoepitaxy of lamellar block copolymers G Claveau, P Quemere, M Argoud, J Hazart, PP Barros, A Sarrazin, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 031604-031604, 2016 | 18 | 2016 |
| PMMA removal selectivity to polystyrene using dry etch approach A Sarrazin, N Posseme, P Pimenta-Barros, S Barnola, A Gharbi, ... Journal of Vacuum Science & Technology B 34 (6), 2016 | 15 | 2016 |
| Single step synthesis and organization of gold colloids assisted by copolymer templates A Sarrazin, A Gontier, A Plaud, J Béal, H Yockell-Lelièvre, JL Bijeon, ... Nanotechnology 25 (22), 225603, 2014 | 15 | 2014 |
| Copolymer template control of gold nanoparticle synthesis via thermal annealing A Plaud, A Sarrazin, J Béal, J Proust, P Royer, JL Bijeon, J Plain, ... Journal of nanoparticle research 15, 1-6, 2013 | 12 | 2013 |
| A new FDSOI spin qubit platform with 40nm effective control pitch T Bédécarrats, BC Paz, BM Diaz, H Niebojewski, B Bertrand, N Rambal, ... 2021 IEEE International Electron Devices Meeting (IEDM), 1-4, 2021 | 10 | 2021 |
| New CH4-N2 dry etch chemistry for poly (methyl methacrylate) removal without consuming polystyrene for lamellar copolymers application A Sarrazin, N Posseme, P Pimenta-Barros, S Barnola, R Tiron, ... Journal of Vacuum Science & Technology B 37 (3), 2019 | 7 | 2019 |
| Strategies for self-organization of Au nanoparticles assisted by copolymer templates T Maurer, A Sarrazin, A Plaud, J Béal, R Nicolas, SS Lamarre, J Proust, ... Plasmonics: Metallic Nanostructures and Their Optical Properties XI 8809 …, 2013 | 7 | 2013 |
| Block copolymer selectivity: A new dry etch approach for cylindrical applications A Sarrazin, N Posseme, P Pimenta-Barros, S Barnola, A Gharbi, ... Journal of Vacuum Science & Technology B 36 (4), 2018 | 6 | 2018 |
| Method for selective etching of a block copolymer N Posseme, A Sarrazin US Patent App. 15/759,123, 2018 | 3 | 2018 |
| Développement de techniques de patterning avancées pour les filières CMOS-sub 10nm A Sarrazin Nantes, 2017 | 3 | 2017 |
| PMMA removal selectivity to PS using dry etch approach: sub-10nm patterning application A Sarrazin, N Posseme, PP Barros, S Barnola, G Claveau, A Gharbi, ... Advanced Etch Technology for Nanopatterning V 9782, 9-19, 2016 | 3 | 2016 |
| Process highlights to enhance DSA contact patterning performances A Gharbi, R Tiron, M Argoud, G Chamiot-Maitral, A Fouquet, C Lapeyre, ... Alternative Lithographic Technologies VIII 9777, 159-167, 2016 | 3 | 2016 |
| 3D sequential integration: applications and associated key enabling modules (design & technology) P Batude, O Billoint, S Thuries, P Malinge, C Fenouillet-Beranger, ... 2021 IEEE International Electron Devices Meeting (IEDM), 3.2. 1-3.2. 4, 2021 | 2 | 2021 |
| Chitosan as a water-based photoresist for DUV lithography I Servin, A Teolis, AF Bazin, A Sarrazin, P Durin, O Sysova, C Gablin, ... Advances in Patterning Materials and Processes XL 12498, 227-238, 2023 | 1 | 2023 |
| Nanoimprint, DSA, and multi-beam lithography: patterning technologies with new integration challenges S Landis, H Teyssedre, G Claveau, I Servin, F Delachat, ML Pourteau, ... Advanced Etch Technology for Nanopatterning VI 10149, 35-47, 2017 | 1 | 2017 |
| PMMA removal selectivity to PS using dry etch approach for sub-10nm node applications A Sarrazin, P Pimenta-Barros, N Posseme, S Barnola, A Gharbi, ... 2015 China Semiconductor Technology International Conference, 1-3, 2015 | 1 | 2015 |
| Fabrication of 3D microstructures by controlled bending of suspended microdisks R Feougier, A Aliane, A Sarrazin, Z Mehrez, N Posseme, R Tiron Novel Patterning Technologies 2024 12956, 153-158, 2024 | | 2024 |
| Life cycle assessment of etching processes for FDSOI transistors technologies M Renaud, A Sarrazin, J Lopes-Barbosa, Y Rivoira, I Servin, F Boulard Advanced Etch Technology and Process Integration for Nanopatterning XIII …, 2024 | | 2024 |
