Plasma frequency measurements for absolute plasma density by means of wave cutoff method JH Kim, DJ Seong, JY Lim, KH Chung Applied physics letters 83 (23), 4725-4727, 2003 | 107 | 2003 |
Wave cutoff method to measure absolute electron density in cold plasma JH Kim, SC Choi, YH Shin, KH Chung Review of scientific instruments 75 (8), 2706-2710, 2004 | 66 | 2004 |
The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor MA Sobolewski, JH Kim Journal of Applied Physics 102, 113302, 2007 | 62 | 2007 |
The deposition of SiOF film with low dielectric constant in a helicon plasma source JH Kim, SH Seo, SM Yun, HY Chang, KM Lee, CK Choi Applied physics letters 68 (11), 1507-1509, 1996 | 62 | 1996 |
Frequency dependence of helicon wave plasmas near lower hybrid resonance frequency SM Yun, JH Kim, HY Chang Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 15 (3 …, 1997 | 40 | 1997 |
A study on ion energy distribution functions and plasma potentials in helicon wave plasmas JH Kim, HY Chang Physics of Plasmas 3 (4), 1462-1469, 1996 | 38 | 1996 |
Evolution of electron temperature in inductively coupled plasma HC Lee, BH Seo, DC Kwon, JH Kim, DJ Seong, SJ Oh, CW Chung, ... Applied Physics Letters 110 (1), 014106, 2017 | 24 | 2017 |
m=/spl plusmn/1 and m=/spl plusmn/2 mode helicon wave excitation JH Kim, SM Yun, HY Chang IEEE transactions on plasma science 24 (6), 1364-1370, 1996 | 24 | 1996 |
Plasma density measurements by phase resolved cutoff JH Kwon, SJ You, JH Kim, YH Shin Applied Physics Letters 96, 081502, 2010 | 22 | 2010 |
Wave transmission characteristics of a wave-cutoff probe in weakly ionized plasmas HS Jun, BK Na, HY Chang, JH Kim Physics of Plasmas 14 (9), 093506, 2007 | 19 | 2007 |
Analysis of the uncertainty in the measurement of electron densities in plasmas using the wave cutoff method JH Kim, KH Chung, YH Shin Metrologia 42 (2), 110, 2005 | 19 | 2005 |
Characterization of remote inductively coupled plasma for carbon nitride thin-film deposition H Seo, JH Kim, KH Chung, JY Kim, SH Kim, H Jeon Journal of applied physics 98 (4), 043308, 2005 | 17 | 2005 |
Characteristics of CFx radicals and plasma parameters in an inductively coupled CF4 plasma JH Kim, KH Chung, YS Yoo Journal of the Korean Physical Society 47 (2), 249, 2005 | 17 | 2005 |
Deposition and plasma measurements of Zr-oxide films with low impurity concentrations by remote PEALD JY Kim, SH Kim, H Seo, JH Kim, H Jeon Electrochemical and solid-state letters 8 (3), G82, 2005 | 17 | 2005 |
Computational comparative study of microwave probes for plasma density measurement DW Kim, SJ You, JH Kim, HY Chang, WY Oh Plasma Sources Science and Technology 25 (3), 035026, 2016 | 16 | 2016 |
Effect of substrate bias on deposition behaviour of charged silicon nanoparticles in ICP-CVD process SW Yoo, SJ You, JH Kim, DJ Seong, BH Seo, NM Hwang Journal of Physics D: Applied Physics 50 (3), 035201, 2016 | 15 | 2016 |
Study on self-bias voltage induced on the substrate by rf bias power in a high density plasma JH Kim, YH Shin, KH Chung Thin Solid Films 435 (1-2), 288-292, 2003 | 15 | 2003 |
Evolution of electron temperature in low pressure magnetized capacitive plasma SJ You, GY Park, JH Kwon, JH Kim, HY Chang, JK Lee, DJ Seong, ... Applied Physics Letters 96 (10), 101504, 2010 | 14 | 2010 |
Characteristics of self bias voltage and poly-Si etching in pulsed helicon wave plasma JH Kim, CJ Kang, TH Ahn, JT Moon Thin Solid Films 345 (1), 124-129, 1999 | 14 | 1999 |
Anomalous evolution of Ar metastable density with electron density in high density Ar discharge M Park, HY Chang, SJ You, JH Kim, YH Shin Physics of Plasmas 18 (10), 103510, 2011 | 13 | 2011 |