Jung-Hyung Kim
Jung-Hyung Kim
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Plasma frequency measurements for absolute plasma density by means of wave cutoff method
JH Kim, DJ Seong, JY Lim, KH Chung
Applied physics letters 83 (23), 4725-4727, 2003
Wave cutoff method to measure absolute electron density in cold plasma
JH Kim, SC Choi, YH Shin, KH Chung
Review of scientific instruments 75 (8), 2706-2710, 2004
The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor
MA Sobolewski, JH Kim
Journal of Applied Physics 102, 113302, 2007
The deposition of SiOF film with low dielectric constant in a helicon plasma source
JH Kim, SH Seo, SM Yun, HY Chang, KM Lee, CK Choi
Applied physics letters 68 (11), 1507-1509, 1996
Frequency dependence of helicon wave plasmas near lower hybrid resonance frequency
SM Yun, JH Kim, HY Chang
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 15 (3 …, 1997
A study on ion energy distribution functions and plasma potentials in helicon wave plasmas
JH Kim, HY Chang
Physics of Plasmas 3 (4), 1462-1469, 1996
Evolution of electron temperature in inductively coupled plasma
HC Lee, BH Seo, DC Kwon, JH Kim, DJ Seong, SJ Oh, CW Chung, ...
Applied Physics Letters 110 (1), 014106, 2017
m=/spl plusmn/1 and m=/spl plusmn/2 mode helicon wave excitation
JH Kim, SM Yun, HY Chang
IEEE transactions on plasma science 24 (6), 1364-1370, 1996
Plasma density measurements by phase resolved cutoff
JH Kwon, SJ You, JH Kim, YH Shin
Applied Physics Letters 96, 081502, 2010
Wave transmission characteristics of a wave-cutoff probe in weakly ionized plasmas
HS Jun, BK Na, HY Chang, JH Kim
Physics of Plasmas 14 (9), 093506, 2007
Analysis of the uncertainty in the measurement of electron densities in plasmas using the wave cutoff method
JH Kim, KH Chung, YH Shin
Metrologia 42 (2), 110, 2005
Characterization of remote inductively coupled plasma for carbon nitride thin-film deposition
H Seo, JH Kim, KH Chung, JY Kim, SH Kim, H Jeon
Journal of applied physics 98 (4), 043308, 2005
Characteristics of CFx radicals and plasma parameters in an inductively coupled CF4 plasma
JH Kim, KH Chung, YS Yoo
Journal of the Korean Physical Society 47 (2), 249, 2005
Deposition and plasma measurements of Zr-oxide films with low impurity concentrations by remote PEALD
JY Kim, SH Kim, H Seo, JH Kim, H Jeon
Electrochemical and solid-state letters 8 (3), G82, 2005
Computational comparative study of microwave probes for plasma density measurement
DW Kim, SJ You, JH Kim, HY Chang, WY Oh
Plasma Sources Science and Technology 25 (3), 035026, 2016
Effect of substrate bias on deposition behaviour of charged silicon nanoparticles in ICP-CVD process
SW Yoo, SJ You, JH Kim, DJ Seong, BH Seo, NM Hwang
Journal of Physics D: Applied Physics 50 (3), 035201, 2016
Study on self-bias voltage induced on the substrate by rf bias power in a high density plasma
JH Kim, YH Shin, KH Chung
Thin Solid Films 435 (1-2), 288-292, 2003
Evolution of electron temperature in low pressure magnetized capacitive plasma
SJ You, GY Park, JH Kwon, JH Kim, HY Chang, JK Lee, DJ Seong, ...
Applied Physics Letters 96 (10), 101504, 2010
Characteristics of self bias voltage and poly-Si etching in pulsed helicon wave plasma
JH Kim, CJ Kang, TH Ahn, JT Moon
Thin Solid Films 345 (1), 124-129, 1999
Anomalous evolution of Ar metastable density with electron density in high density Ar discharge
M Park, HY Chang, SJ You, JH Kim, YH Shin
Physics of Plasmas 18 (10), 103510, 2011
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