| Sub-diffraction-limited patterning using evanescent near-field optical lithography MM Alkaisi, RJ Blaikie, SJ McNab, R Cheung, DRS Cumming Applied physics letters 75 (22), 3560-3562, 1999 | 284 | 1999 |
| Metal Schottky diodes on Zn-polar and O-polar bulk ZnO MW Allen, MM Alkaisi, SM Durbin Applied physics letters 89 (10), 2006 | 182 | 2006 |
| Nanostructures for light trapping in thin film solar cells A Peter Amalathas, MM Alkaisi Micromachines 10 (9), 619, 2019 | 155 | 2019 |
| Damage studies in dry etched textured silicon surfaces G Kumaravelu, MM Alkaisi, A Bittar, D MacDonald, J Zhao Current Applied Physics 4 (2-4), 108-110, 2004 | 109 | 2004 |
| Inverted nanopyramid texturing for silicon solar cells using interference lithography S Sivasubramaniam, MM Alkaisi Microelectronic Engineering 119, 146-150, 2014 | 105 | 2014 |
| On-chip analysis of C. elegans muscular forces and locomotion patterns in microstructured environments S Johari, V Nock, MM Alkaisi, W Wang Lab on a Chip 13 (9), 1699-1707, 2013 | 105 | 2013 |
| Nanolithography in the evanescent near field MM Alkaisi, RJ Blaikie, SJ McNab Advanced Materials 13 (12‐13), 877-887, 2001 | 78 | 2001 |
| Super-resolution near-field lithography using planar silver lenses: A review of recent developments RJ Blaikie, DOS Melville, MM Alkaisi Microelectronic Engineering 83 (4-9), 723-729, 2006 | 76 | 2006 |
| Efficient light trapping nanopyramid structures for solar cells patterned using UV nanoimprint lithography AP Amalathas, MM Alkaisi Materials Science in Semiconductor Processing 57, 54-58, 2017 | 68 | 2017 |
| Effects of film thickness and sputtering power on properties of ITO thin films deposited by RF magnetron sputtering without oxygen AP Amalathas, MM Alkaisi Journal of Materials Science: Materials in Electronics 27, 11064-11071, 2016 | 64 | 2016 |
| Surface texturing for silicon solar cells using reactive ion etching technique G Kumaravelu, MM Alkaisi, A Bittar Conference Record of the Twenty-Ninth IEEE Photovoltaic Specialists …, 2002 | 64 | 2002 |
| Low temperature nanoimprint lithography using silicon nitride molds MM Alkaisi, RJ Blaikie, SJ McNab Microelectronic engineering 57, 367-373, 2001 | 55 | 2001 |
| Direct writing and characterization of three-dimensional conducting polymer PEDOT arrays P Zhang, N Aydemir, M Alkaisi, DE Williams, J Travas-Sejdic ACS applied materials & interfaces 10 (14), 11888-11895, 2018 | 54 | 2018 |
| UV sensing using surface acoustic wave device on DC sputtered ZnO monolayer LP Schuler, MM Alkaisi, P Miller, RJ Reeves Microelectronic Engineering 83 (4-9), 1403-1406, 2006 | 48 | 2006 |
| Nanolithography using optical contact exposure in the evanescent near field RJ Blaikie, MM Alkaisi, SJ McNab, DRS Cumming, R Cheung, DG Hasko Microelectronic engineering 46 (1-4), 85-88, 1999 | 45 | 1999 |
| Cellular transfer and AFM imaging of cancer cells using Bioimprint JJ Muys, MM Alkaisi, DOS Melville, J Nagase, P Sykes, GM Parguez, ... Journal of Nanobiotechnology 4, 1-10, 2006 | 42 | 2006 |
| Positive and negative bioimprinted polymeric substrates: new platforms for cell culture I Mutreja, TBF Woodfield, S Sperling, V Nock, JJ Evans, MM Alkaisi Biofabrication 7 (2), 025002, 2015 | 39 | 2015 |
| Multilevel nanoimprint lithography MM Alkaisi, W Jayatissa, M Konijn Current Applied Physics 4 (2-4), 111-114, 2004 | 36 | 2004 |
| Step coverage of thin titania films on patterned silicon substrate by pulsed-pressure MOCVD V Siriwongrungson, MM Alkaisi, SP Krumdieck Surface and coatings technology 201 (22-23), 8944-8949, 2007 | 33 | 2007 |
| 70 nm features on 140 nm period using evanescent near field optical lithography MM Alkaisi, RJ Blaikie, SJ McNab Microelectronic engineering 53 (1-4), 237-240, 2000 | 33 | 2000 |
Khairudin MohamedSchool of Mechanical Engineering, Universiti Sains MalaysiaVerified email at usm.my
